Microstructure and electrical property of tantalum oxynitride thin films preparedusing high-power impulse reactive magnetron sputtering
李英杰
李英杰
Categories: Journal  /   SCI(Sciences Citation Index)  /  
Year2020
Author
Created date2021-03-24
Author orderThe third author
Corresponding authorYes
Publication year2020
Publication month10
Journal nameJapanese Journal of Applied Physics,
Publication area日本
Volume59
Issue11
Start page11650
End page11650
Review systemYes
LanguageTraditional Chinese