Influences of annealing temperature on microstructure and properties for TiO2 films deposited by DC magnetron sputtering

Influences of annealing temperature on microstructure and properties for TiO2 films deposited by DC magnetron sputtering

Year2015
Author鄭達智*
Author count1
Created date2019-03-26
Author order第三作者
Corresponding author
Publication year2015
Publication month10
Journal nameJapanese Journal of Applied Physics
Publication area英國
Issue54
Publication type
Review system
LanguageForeign Language
Attached project----