Influences of annealing temperature on microstructure and properties for TiO2 films deposited by DC magnetron sputtering
Influences of annealing temperature on microstructure and properties for TiO2 films deposited by DC magnetron sputtering
Year | 2015 |
Author | 鄭達智* |
Author count | 1 |
Created date | 2019-03-26 |
Author order | 第三作者 |
Corresponding author | 否 |
Publication year | 2015 |
Publication month | 10 |
Journal name | Japanese Journal of Applied Physics |
Publication area | 英國 |
Issue | 54 |
Publication type | |
Review system | 是 |
Language | Foreign Language |
Attached project | ---- |