The Optimum Conditions for Preparing the ZnO films by the cathode arc plasma technique Using the Taguchi Method
| Year | 2011 |
| Author | Shuo-Fu Hsu, Jyh-Horng Chou, Chun-Hsiung Fang, 楊茹媛*, Min-Hang Weng |
| Author count | 5 |
| Created date | 2019-02-19 |
| Author order | 4 |
| Corresponding author | false |
| Publication year | 2011 |
| Symposium name | Taiwan Association for Coating and Thin Film Technology |
| Publication country | 中華民國 |
| Start date | 2011-09-20 |
| End date | 2011-09-20 |
| Review system | 否 |
| Language | Foreign Language |