The Construction of Coherence Microscope for Extreme Ultraviolet Mask Defect Inspection in Synchrotron Facility
The Construction of Coherence Microscope for Extreme Ultraviolet Mask Defect Inspection in Synchrotron Facility
| Year | 2017 |
| Author | Chuang, Jyun-Yan*, Lin, Yu-Zheng, Chen, Wei-Cheng, 林章生 |
| Author count | 4 |
| Created date | 2019-02-19 |
| Author order | 4 |
| Corresponding author | false |
| Publication year | 2017 |
| Symposium name | 2017 IEEE/SICE SII International Symposium on System Integration (SII 2017) |
| Publication city | 台北市 |
| Publication country | 中華民國 |
| Start date | 2017-12-13 |
| End date | 2017-12-13 |
| Review system | 否 |
| Language | Foreign Language |