Study on the MOCVD Epitaxy Deposition Uniformity by a Three-Dimensional Flow Model

Study on the MOCVD Epitaxy Deposition Uniformity by a Three-Dimensional Flow Model

Professor    08-7703202#7459、(L)7604    chtsai@mail.npust.edu.tw
Year2002
Author
Created date2019-02-19
Author order4
Corresponding authorfalse
Publication year2002
Symposium nameThe 26th National Conference on Theoretical and Applied Mechanics
Publication country中華民國
Start date2002-12-01
End date2002-12-01
Review system
LanguageTraditional Chinese