Properties of low temperature deposited ZnO thin films on the glass substrate by cathodic arc plasma technology with different film thickness

Properties of low temperature deposited ZnO thin films on the glass substrate by cathodic arc plasma technology with different film thickness

Year2013
Author楊茹媛*, , ,
Author count4
Created date2019-02-19
Author order第一作者
Corresponding author
Publication year2013
Publication month9
Journal nameAdvanced Science Letters
Publication area中華民國
Volume9
Issue19
Start page2818
End page2822
Publication type
Review system
LanguageForeign Language
Attached project