Microstructure and electrical property of tantalum oxynitride thin films preparedusing high-power impulse reactive magnetron sputtering
| Year | 2020 |
| Author | 李英杰* |
| Author count | 1 |
| Created date | 2021-03-24 |
| Author order | 第三作者 |
| Corresponding author | 是 |
| Publication year | 2020 |
| Publication month | 10 |
| Journal name | Japanese Journal of Applied Physics, |
| Publication area | 日本 |
| Volume | 59 |
| Issue | 11 |
| Start page | 11650 |
| End page | 11650 |
| Publication type | |
| Review system | 是 |
| Language | Traditional Chinese |