MOCVD磊晶沈積均勻度的三維熱流數值研究(Study on the MOCVD Epitaxy Deposition Uniformity by a Three-Dimensional Flow Model)
MOCVD磊晶沈積均勻度的三維熱流數值研究(Study on the MOCVD Epitaxy Deposition Uniformity by a Three-Dimensional Flow Model)
Year | 2002 |
Author | |
Created date | 2019-02-19 |
Author order | 4 |
Corresponding author | false |
Publication year | 2002 |
Symposium name | B037中華民國力學學會第二十六屆全國力學會議 |
Publication country | 中華民國 |
Start date | 2002-12-01 |
End date | 2002-12-01 |
Review system | 否 |
Language | Traditional Chinese |