MOCVD磊晶沈積均勻度的三維熱流數值研究(Study on the MOCVD Epitaxy Deposition Uniformity by a Three-Dimensional Flow Model)
MOCVD磊晶沈積均勻度的三維熱流數值研究(Study on the MOCVD Epitaxy Deposition Uniformity by a Three-Dimensional Flow Model)
| Year | 2002 |
| Author | |
| Created date | 2019-02-19 |
| Author order | 4 |
| Corresponding author | false |
| Publication year | 2002 |
| Symposium name | B037中華民國力學學會第二十六屆全國力學會議 |
| Publication country | 中華民國 |
| Start date | 2002-12-01 |
| End date | 2002-12-01 |
| Review system | 否 |
| Language | Traditional Chinese |