Influences of annealing temperature on microstructure and properties for TiO2 films deposited by DC magnetron sputtering.
Influences of annealing temperature on microstructure and properties for TiO2 films deposited by DC magnetron sputtering.
Year | 2015 |
Author | Shang, Jie-Ting*, 陳志銘, Ta-Chih Cheng, Ying-Chieh Lee |
Author count | 4 |
Created date | 2019-02-19 |
Author order | 第二作者 |
Corresponding author | 否 |
Publication year | 2015 |
Publication month | 6 |
Journal name | Japanese Journal of Applied Physics |
Publication area | 中華民國 |
Volume | 54(12):125501-1 ~ 125501-6 |
Publication type | |
Review system | 否 |
Language | Foreign Language |
Attached project | 無 |