Influence of Die-shift-distance of Overhang Dies on Residual Thermal Shear Stress in 5-chip SiP after EMC Curing
Influence of Die-shift-distance of Overhang Dies on Residual Thermal Shear Stress in 5-chip SiP after EMC Curing
Year | 2016 |
Author | |
Created date | 2019-01-16 |
Author order | 第三作者 |
Corresponding author | 是 |
Publication year | 2016 |
Publication month | 2 |
Journal name | Materials and Design |
Publication area | 荷蘭王國 |
Volume | 512–521 |
Issue | 92 |
Publication type | |
Review system | 是 |
Language | Foreign Language |
Attached project | 無 |