The Optimum Conditions for Preparing the ZnO films by the cathode arc plasma technique Using the Taguchi Method
The Optimum Conditions for Preparing the ZnO films by the cathode arc plasma technique Using the Taguchi Method
Year | 2011 |
Author | Shuo-Fu Hsu, Jyh-Horng Chou, Chun-Hsiung Fang, 楊茹媛*, Min-Hang Weng |
Author count | 5 |
Created date | 2019-02-19 |
Author order | 4 |
Corresponding author | false |
Publication year | 2011 |
Symposium name | Taiwan Association for Coating and Thin Film Technology |
Publication country | 中華民國 |
Start date | 2011-09-20 |
End date | 2011-09-20 |
Review system | 否 |
Language | Foreign Language |