A Study of Nickel-Chromium-Silicon Thin Film Deposited By Co-Sputter

A Study of Nickel-Chromium-Silicon Thin Film Deposited By Co-Sputter

Year2011
AuthorYun-Lin Huang, 李英杰*, Yi-Bin Chen
Author count3
Created date2019-02-19
Author order2
Corresponding authorfalse
Publication year2011
Symposium name2011 International Symposium on Nano Science and Technology (ISNST’10)
Publication cityTainan
Publication country中華民國
Start date2011-11-18
End date2011-11-18
Review system
LanguageForeign Language