Reaction Mechanisms in Both a CHF3/O2/Ar and CHF3/H2/Ar Radio Frequency Plasma Environment
Year | 1999 |
Author | Ya-Fen Wang*, Wen-Jhy Lee, Chuh-Yung Chen, 謝連德 |
Author count | 4 |
Created date | 2019-02-19 |
Author order | 第四(以上)作者 |
Corresponding author | 否 |
Publication year | 1999 |
Publication month | 9 |
Journal name | Industrial and Engineering Chemistry Research |
Publication area | 中華民國 |
Volume | 38 |
Issue | 9 |
Start page | 3199 |
End page | 3210 |
Publication type | |
Review system | 否 |
Language | Foreign Language |
Attached project | 無 |