Reaction Mechanisms in Both a CHF3/O2/Ar and CHF3/H2/Ar Radio Frequency Plasma Environment
| Year | 1999 |
| Author | Ya-Fen Wang*, Wen-Jhy Lee, Chuh-Yung Chen, 謝連德 |
| Author count | 4 |
| Created date | 2019-02-19 |
| Author order | 第四(以上)作者 |
| Corresponding author | 否 |
| Publication year | 1999 |
| Publication month | 9 |
| Journal name | Industrial and Engineering Chemistry Research |
| Publication area | 中華民國 |
| Volume | 38 |
| Issue | 9 |
| Start page | 3199 |
| End page | 3210 |
| Publication type | |
| Review system | 否 |
| Language | Foreign Language |
| Attached project | 無 |