Reaction Mechanisms in Both a CHF3/O2/Ar and CHF3/H2/Ar Radio Frequency Plasma Environment

Reaction Mechanisms in Both a CHF3/O2/Ar and CHF3/H2/Ar Radio Frequency Plasma Environment

Professor    辦公室: CE422(分機7512) 實驗室: EP207(分機7075)    lthsieh@mail.npust.edu.tw
Year1999
AuthorYa-Fen Wang*, Wen-Jhy Lee, Chuh-Yung Chen, 謝連德
Author count4
Created date2019-02-19
Author order第四(以上)作者
Corresponding author
Publication year1999
Publication month9
Journal nameIndustrial and Engineering Chemistry Research
Publication area中華民國
Volume38
Issue9
Start page3199
End page3210
Publication type
Review system
LanguageForeign Language
Attached project