Effect of a rotating magnetic field on the moving pattern and collision attrition of magnetic particles
| Year | 2008 |
| Author | 周春禧*, C. H. Yeh, |
| Author count | 2 |
| Created date | 2019-02-19 |
| Author order | 第一作者 |
| Corresponding author | 是 |
| Publication year | 2008 |
| Publication month | 5 |
| Journal name | Advanced Powder Technology |
| Journal sponsor | Koninklijke Brill NV, Leiden and Society of Powder Technology, Japan |
| Publication area | 中華民國 |
| Volume | 19 |
| Issue | 3 |
| Start page | 253 |
| End page | 275 |
| Publication type | |
| Review system | 否 |
| Language | Foreign Language |
| Attached project | 無 |