Influence of Die-shift-distance of Overhang Dies on Residual Thermal Shear Stress in 5-chip SiP after EMC Curing

Influence of Die-shift-distance of Overhang Dies on Residual Thermal Shear Stress in 5-chip SiP after EMC Curing

Professor    7016 實驗室:粉體技術研發實驗室 (分機7348)    cschou@mail.npust.edu.tw
Year2016
Author
Created date2019-01-16
Author order第三作者
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Publication year2016
Publication month2
Journal nameMaterials and Design
Publication area荷蘭王國
Volume512–521
Issue92
Publication type
Review system
LanguageForeign Language
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