Influences of Annealing Temperature on Microstructure and Properties for TiO2 Films Deposited by DC Magnetron Sputtering

Influences of Annealing Temperature on Microstructure and Properties for TiO2 Films Deposited by DC Magnetron Sputtering

Year2015
Author
Created date2019-01-16
Author order第四(以上)作者
Corresponding author
Publication year2015
Publication month10
Journal nameJapan Journal of Applied Physics
Publication area日本
Volume54
Issue----
Publication type
Review system
LanguageForeign Language
Attached project----