Influences of Annealing Temperature on Microstructure and Properties for TiO2 Films Deposited by DC Magnetron Sputtering
Influences of Annealing Temperature on Microstructure and Properties for TiO2 Films Deposited by DC Magnetron Sputtering
Year | 2015 |
Author | |
Created date | 2019-01-16 |
Author order | 第四(以上)作者 |
Corresponding author | 是 |
Publication year | 2015 |
Publication month | 10 |
Journal name | Japan Journal of Applied Physics |
Publication area | 日本 |
Volume | 54 |
Issue | ---- |
Publication type | |
Review system | 是 |
Language | Foreign Language |
Attached project | ---- |